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    Home»New Tech Release»U.S. and Polish Research Teams Develop World’s First Transistor-LED Dual-Electronic Chip
    New Tech Release

    U.S. and Polish Research Teams Develop World’s First Transistor-LED Dual-Electronic Chip

    Doris MiniMicroLEDBy Doris MiniMicroLEDOctober 25, 2024Updated:October 28, 2024No Comments9 Mins Read13 Views
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    U.S. and Polish Research Teams Develop World's First Transistor-LED Dual-Electronic Chip
    The grey arrows indicate the chronological order of the growth procedure. a, Ga bonding of the GaN substrate and MBE growth of the (In,Ga,Al)N LED along the metal-polar direction. b, Unloading, cleaning, flipping, Ga bonding and reloading of the sample. c, MBE growth of the GaN/AlGaN HEMT along the N-polar direction.
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    Table of Contents

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    • Breakthrough in Chip Technology
    • Published Research
    • Project Leadership
    • Technical Details
      • Fabrication Process
    • Unique Achievements
    • Collaboration and Development
    • Testing Innovations
    • Potential Applications

    Breakthrough in Chip Technology

    Researchers from Cornell University and the Polish Academy of Sciences have teamed up to develop the world’s first chip that seamlessly combines LED and transistor technologies. This innovative Transistor-LED Chip paves the way for smaller, more affordable, and highly efficient LEDs, revolutionizing the possibilities in the field.

    Published Research

    The team’s paper, titled “Using Polar Semiconductor Wafers in Functional Devices,” was published in Nature on September 25. The principal authors include doctoral students Len van Deurzen and Yingkyun Kim.

    Project Leadership

    This project was led by Debdeep Jena and William L. Quackenbush, professors in the Electrical and Computer Engineering and Materials Science and Engineering departments at Cornell University.

    Technical Details

    The researchers constructed gallium nitride (GaN) devices with a high electron mobility transistor (HEMT) on one side and an LED on the other. They leveraged GaN’s unique property of significant electronic polarization along its crystal axis, resulting in different physical and chemical properties on each surface. The gallium side is suited for photonic devices, while the nitrogen side is ideal for transistor applications.

    Fabrication Process

    The team first grew a transparent GaN substrate (400 micrometers thick) on a single crystal wafer. They then utilized molecular beam epitaxy (MBE) technology to grow HEMT and LED heterostructures. After the devices were transported to Cornell University, Kim constructed and processed the HEMT on the nitrogen side. The final step involved creating the LED on the metal side, using a thick positive photoresist layer to protect the previously processed n-type surface.

    figure 2
    a, Schematic showing the HEMT-LED heterostructures grown on both faces of a single-crystal c-plane n-GaN substrate. b, HAADF-STEM image showing the GaN/Al0.40Ga0.60N/GaN HEMT. Scale bar, 10 nm. c, Atomic-resolution image corresponding to the uppermost GaN/Al0.40Ga0.60N heterojunction interface that hosts the 2DEG. Scale bar, 2 nm. d, iDPC image in the uppermost GaN layer of the HEMT indicating that the nitrogen polarity follows that of the substrate to the surface. Scale bar, 1 nm. e, HAADF-STEM image showing the LED quantum well, electron blocking layer, cladding and contact layers. Scale bar, 100 nm. f, Atomic-resolution image corresponding to the LED In0.07Ga0.93N/In0.17Ga0.83N/In0.07Ga0.93N single quantum well. Scale bar, 2 nm. g, iDPC image of the p-InGaN contact layers of the LED indicating that the metal polarity follows that of the substrate. Scale bar, 1 nm.

    GaN stands out among wide bandgap semiconductors due to its large electronic polarization along its crystal axes, allowing for notably different physical and chemical characteristics on each surface. Gallium (the cation) has proven useful for photonic devices such as LEDs and lasers, while nitrogen (the anion) supports transistor functionality.

    Unique Achievements

    The Jena-Xing lab set out to create a functional device where one side features a high electron mobility transistor (HEMT) driving an LED on the opposite side—a feat not achieved with any material thus far.

    “To our knowledge, no one has created active devices on both sides, even with silicon devices,” said van Deurzen. “One reason is that silicon wafers are cubic, meaning there is no added functionality using both sides; they are essentially the same. But GaN is a polar crystal, so one side has different physical and chemical properties than the other, which gives us an extra degree of design flexibility.”

    figure 3
    a–d, Device processing flow for the double-sided HEMT-LED. Starting from the as-grown heterostructures, the grey arrows follow the independent processing steps chronologically, with the metal-polar LED being processed after the N-polar HEMT. e, A 3D representation of the complete device. f, Optical microscope images of the as-processed sample, focused on the LEDs (right) and on the HEMTs (left). The N-polar HEMTs are oriented upwards, forming the uppermost surface. For scale, the diameter of the large LED anode contact is 140 μm. g, Scanning electron microscope images of the HEMTs on the N-polar GaN surface (bottom) and the LEDs on the metal-polar GaN surface (top).

    Collaboration and Development

    The project was initially conceived by Jena and former postdoctoral researcher Henryk Turski, a co-senior author of the paper. Turski collaborated with a team at the Polish Academy of Sciences‘ High Pressure Research Institute to grow a transparent GaN substrate on the approximately 400-micrometer-thick single crystal wafer.

    figure 4
    a, Normalized drain current (black line) and transconductance (grey line) of an N-polar HEMT as a function of gate-source voltage, operating at a drain-source voltage of 5 V. b, Linear plot showing the family of curves for a HEMT (black lines) for a gate-source voltage ranging from 1.75 (on) to −3.25 V (off). On the right axis, the linear current–voltage characteristics of a 400-μm-diameter LED (blue line) and unnormalized output characteristics of a HEMT are shown as well. The dimensions of the measured HEMTs are LSD = 4 μm, LG = 1.5 μm and WG = 50 μm. c, Semi-log plots showing the unnormalized drain current (solid black line) and gate current (dashed black line) versus gate-source voltage, for a drain-source voltage of 5 V. Here the transistor current corresponds to the left vertical axis. The horizontal dashed black line indicates a normalized channel sheet current density of 1 A mm−1. Similarly, corresponding to the right vertical axis is the LED current (blue line) as a function of forward bias for a 400-μm-diameter device. d, Electroluminescence spectra of a metal-polar, 400-μm-diameter LED. The injection current density ranges from 1 to 140 A cm−2. The inset shows a camera image of the sample with an LED in the on state. a.u., arbitrary units.

    Following this, the HEMT and LED heterostructures were grown in Poland using molecular beam epitaxy. Once the epitaxy was complete, the chip was sent to Cornell, where Kim worked on the nitrogen side.

    Kim noted, “The chemical reactivity on the nitrogen side is higher, which means the electron channel can be easily damaged during device processing. One challenge in manufacturing nitrogen-side transistors is ensuring that all plasma processes and chemical treatments do not damage the transistors. Therefore, a lot of process development is required for transistor manufacturing and design.”

    figure 5
    a, Energy-band diagrams of the HEMT and LED indicating the off and on states. b, Circuit schematic of the monolithic HEMT-LED, taking into account the back-gating effect of the conductive GaN substrate. c,d, Monolithic switching measurements, modulating between on and off (c) and between bright and dim modes (d). The gate-source modulation voltage is shown in red, the photodiode voltage while modulating the LED in solid blue and the background (LED off state) photodiode voltage in dashed blue. a.u., arbitrary units.

    Testing Innovations

    Van Deurzen then constructed the LED on the metal side, employing a thick positive photoresist coating to protect the previously processed n-type surface. After each phase, the researchers measured the device characteristics, confirming they remained unchanged.

    “This is actually a very viable process,” van Deurzen stated. “The devices do not degrade. This is clearly important if you want to use it as a real technology.”

    Given that no one had previously manufactured dual-sided semiconductor devices, the research team had to invent a new method to test and measure it. They assembled a “rough” dual-coated glass plate, connecting one side of the wafer to it to allow detection from the top of both sides.

    Due to the transparency of the GaN substrate across the visible spectrum, light can pass through. A single HEMT device successfully drove a large LED, toggling it on and off at kilohertz frequencies—sufficient for a functioning LED display.

    Potential Applications

    Currently, LED displays operate with separate transistors and distinct manufacturing processes. A direct application of the dual-electronic chip is in Micro LEDs: fewer components, smaller footprint, reduced energy and material requirements, faster production, and lower costs.

    “A good analogy is the iPhone,” Jena explained. “Of course, it’s a phone, but it also has many other functions. It’s a calculator, it’s a map, it allows you to browse the internet. There’s a degree of convergence. I would say that what we’ve demonstrated in this paper as ‘dual-electronic’ could merge two or three functionalities, but it’s actually much larger than that.”

    “Now, you might not need different processors to perform various functions, reducing energy and speed losses during their interconnection, which typically requires further electronics and logic. Through this demonstration, many of these functionalities are condensed onto a single wafer.”

    Other applications include Complementary Metal-Oxide-Semiconductor (CMOS) devices, with one side featuring a polarization-induced n-channel transistor (using electrons) and the other a p-channel transistor (containing holes).

    Additionally, due to the high piezoelectric coefficient of the GaN substrate, it could serve as a bulk acoustic wave resonator for RF signal filtering and amplification in 5G and 6G communications. This semiconductor can also utilize lasers instead of LEDs for “LiFi,” or light-based transmissions.

    “You can essentially expand it to enable the fusion of photonic, electronic, and acoustic devices,” van Deurzen remarked. “What you can do is fundamentally limited only by your imagination, and as we try them in the future, undiscovered functionalities may emerge.”

    Disclaimer: The views and opinions expressed in this article are those of the original authors and do not necessarily reflect the official policy or position of MiniMicroLED Insights . While we strive to ensure the accuracy and reliability of the information provided, the content on this website may include translations, re-edited versions of second-hand information, or information derived from unverifiable sources. MiniMicroLED Insights makes no representations or warranties, express or implied, regarding the completeness, accuracy, or timeliness of such content. The information in this article is for informational purposes only and should not be construed as professional advice. Any reliance you place on such information is strictly at your own risk. To the fullest extent permitted by law, MiniMicroLED Insights disclaims all liability for any direct, indirect, incidental, consequential, or punitive damages arising out of your use of, or reliance on, the information contained in this article.

    Copyright Notice: This article may include translated and re-edited content derived from various online sources, including websites and social media platforms. While we strive to credit the original authors and sources to the best of our ability, we may not always be able to verify the original source of the content. All rights to the original content remain with the original author or source publication. Where applicable, this content is reproduced for educational and informational purposes under the fair use doctrine. If you believe any content on this site infringes upon your intellectual property rights, or if you are the copyright owner and believe we have not credited you correctly, please contact us at minimicroled.business@gmail.com. We will investigate and take corrective action, including removing or properly crediting the content if necessary.

    Content sourced and adapted by MiniMicroLED Insights (Doris).

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