On December 18, Veeco, an American semiconductor equipment manufacturer, announced that PlayNitride has certified its Lumina® MOCVD equipment, which will be used for next-generation Micro LED production. PlayNitride has placed an order for two units, which are scheduled for delivery in 2025.
PlayNitride Expands Micro LED Production
PlayNitride expressed excitement about partnering with Veeco to apply Micro LED technology in the production and commercialization of wearables, TVs, transparent displays, and automotive applications. The high-performance and production advantages of the Lumina® system will play a critical role in optimizing Micro LED technology and cost efficiency for PlayNitride.

Investment Plans to Support Growth
Notably, PlayNitride has continued to expand its core Micro LED business. The company recently launched its first fundraising campaign since its listing, aiming to raise more than NT$2 billion (~$64 million). The funds will be used for capital expenditures, including equipment upgrades at its Zhunan plant, the acquisition of next-generation Micro LED process equipment, and the purchase of a currently leased facility from Epistar.
Financial Growth Driven by Micro LED Business
In 2024, PlayNitride has seen significant growth driven by its Micro LED business. From January to November 2024, the company reported a cumulative revenue of NT$1.61 billion ($51.4 million), marking an 85.81% year-over-year increase. In November alone, its revenue reached NT$322 million ($10.2 million), a remarkable 283.07% increase compared to the same month last year.
Veeco’s Role in PlayNitride’s Micro LED Production
Regarding the purchase, Veeco stated that its Lumina® system, powered by its core TurboDisc® technology, has been widely adopted for scalable mass production. The Lumina® system is capable of meeting PlayNitride’s requirements for high uniformity, high brightness, low defect rates, and low-cost production in Micro LED manufacturing.
Lumina® equipment features Veeco’s proprietary TurboDisc® technology, enabling excellent thickness uniformity, high consistency, and low defect rates, thus achieving high-yield epitaxial layers. Additionally, Veeco’s technology supports long-term reactor cleanliness, ensuring high throughput. The Lumina® system also supports seamless wafer size conversion, enabling high-quality deposition of phosphide arsenide epitaxial layers on 8-inch wafers. Furthermore, the equipment allows users to customize systems for large-scale high-value infrared LEDs (IR-LEDs) production, edge-emitting lasers, VCSELs, and solar cells.

Veeco’s Investment in Compound Semiconductors
Veeco remains optimistic about the growth opportunities in the compound semiconductor market and continues to invest in GaN power semiconductors and Micro LED technologies. The company has already developed MOCVD equipment for 12-inch silicon-based GaN Micro LED production and expects significant orders in 2025.
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